| 摘要 |
A scanning exposure apparatus according to this invention has a light source which can change the central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light. The scanning exposure apparatus includes a controller which controls the light source so that integrated values Sws and Swl obtained by integrating the intensity of the exposure light for each wavelength in the scanning direction in a short-wavelength range and long-wavelength range, respectively, assuming a target central wavelength as a reference satisfy: <?in-line-formulae description="In-line Formulae" end="lead"?>|(Sws-Swl)/(Sws+Swl)|<=0.1 <?in-line-formulae description="In-line Formulae" end="tail"?>
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