发明名称 |
SURFACE MICROSTRUCTURE MANUFACTURING METHOD, DIAMOND NANO ELECTRODE MANUFACTURING METHOD, AND ELECTRODE BODY THEREOF |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a surface microstructure manufacturing method using a nano diamond fine particle, and to provide a diamond nano electrode manufacturing method which uses the microstructure. <P>SOLUTION: There are provided a surface microstructure manufacturing method for manufacturing an unevenness P3 of nano meter order through dry etching by seeding a nano diamond fine particle P2 on the test piece surface of a test piece P1 composed of silicon, gallium arsenide, and diamond and using this as a minute hard mask, and a diamond nano electrode manufacturing method using the microstructure. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2009129962(A) |
申请公布日期 |
2009.06.11 |
申请号 |
JP20070300368 |
申请日期 |
2007.11.20 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
UETSUKA HIROSHI;YANG NIANJUN;NEBEL CHRISTOPH |
分类号 |
H01L21/3065;B82B3/00;H01J1/304;H01J9/02 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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