发明名称 SURFACE MICROSTRUCTURE MANUFACTURING METHOD, DIAMOND NANO ELECTRODE MANUFACTURING METHOD, AND ELECTRODE BODY THEREOF
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a surface microstructure manufacturing method using a nano diamond fine particle, and to provide a diamond nano electrode manufacturing method which uses the microstructure. <P>SOLUTION: There are provided a surface microstructure manufacturing method for manufacturing an unevenness P3 of nano meter order through dry etching by seeding a nano diamond fine particle P2 on the test piece surface of a test piece P1 composed of silicon, gallium arsenide, and diamond and using this as a minute hard mask, and a diamond nano electrode manufacturing method using the microstructure. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009129962(A) 申请公布日期 2009.06.11
申请号 JP20070300368 申请日期 2007.11.20
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 UETSUKA HIROSHI;YANG NIANJUN;NEBEL CHRISTOPH
分类号 H01L21/3065;B82B3/00;H01J1/304;H01J9/02 主分类号 H01L21/3065
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