| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion beam processor allowing irradiation with stable ion beams, and to provide an ion beam processing method. SOLUTION: In preparation for irradiation with the ion beams, a material gas is supplied to an ion source and a processing chamber (S11), a standby chamber is evacuated (S12), electrons are emitted into a processing chamber by an electron neutralizer (S13) and voltage is applied to a coil (S14) to generate plasma in a discharge vessel. With the plasma generated in the discharge vessel, 0V is applied to a screen grid and an acceleration grid and a plus voltage is applied to a deceleration grid (S15). The electrons emitted from the electron neutralizer 32 are drawn into collision with the deceleration grid to heat the deceleration grid. The electrons in the plasma in the discharge vessel come into collision with the screen grid and heat the grid. Thus, the screen grid and the deceleration grid are heated in advance before irradiated with the ion beams. COPYRIGHT: (C)2009,JPO&INPIT
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