| 摘要 |
An apparatus for forming an etching region is provided to prevent generation of overload in a driving system or an electrical system due to a stage load by correcting a sealing position while moving a stamp. A chamber part(4) is installed on a frame(2), and provides a sealing space of a fixed size. A stamp(6) is positioned inside the chamber part, has a pattern surface for classifying an etching region or a non-etching region. A holder unit fixes the stamp into a state capable of being attached/detached in the chamber part. A stage(8) has a loading surface which loads a substrate, and is positioned in a bottom side of the stamp. A driving unit(10) generates/delivers a power in order to attach/detach the stamp and the substrate. An aligning unit(12) is arranged in a top side of the holder unit, and corrects a position of the holder unit.
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