发明名称 Group III nitride semiconductor crystal substrate and semiconductor device
摘要 A group III nitride semiconductor crystal substrate (20a) has a diameter of at least 25 mm and not more than 160 mm. The resistivity of the group III nitride semiconductor crystal substrate (20a) is at least 1 × 10 -4 ©·cm and not more than 0.1 ©·cm. The resistivity distribution in the diameter direction of the group III nitride semiconductor crystal (20a) is at least -30% and not more than 30%. The resistivity distribution in the thickness direction of the group III nitride semiconductor crystal (20a) is at least -16% and not more than 16%.
申请公布号 EP2065491(A3) 申请公布日期 2009.06.10
申请号 EP20080020196 申请日期 2008.11.19
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 OKAHISA, TAKUJI;KAWASE, TOMOHIRO;UEMURA, TOMOKI;NISHIOKA, MUNEYUKI;ARAKAWA, SATOSHI
分类号 C30B29/40;H01L29/20;H01L33/32 主分类号 C30B29/40
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