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发明名称
Group III nitride semiconductor crystal substrate and semiconductor device
摘要
A group III nitride semiconductor crystal substrate (20a) has a diameter of at least 25 mm and not more than 160 mm. The resistivity of the group III nitride semiconductor crystal substrate (20a) is at least 1 × 10 -4 ©·cm and not more than 0.1 ©·cm. The resistivity distribution in the diameter direction of the group III nitride semiconductor crystal (20a) is at least -30% and not more than 30%. The resistivity distribution in the thickness direction of the group III nitride semiconductor crystal (20a) is at least -16% and not more than 16%.
申请公布号
EP2065491(A3)
申请公布日期
2009.06.10
申请号
EP20080020196
申请日期
2008.11.19
申请人
SUMITOMO ELECTRIC INDUSTRIES, LTD.
发明人
OKAHISA, TAKUJI;KAWASE, TOMOHIRO;UEMURA, TOMOKI;NISHIOKA, MUNEYUKI;ARAKAWA, SATOSHI
分类号
C30B29/40;H01L29/20;H01L33/32
主分类号
C30B29/40
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