High resolution gas field ion column with reduced sample load

摘要

A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method being adapted for high imaging resolutions below 1 nm includes emitting an ion beam from a gas field ion source, providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.