摘要 |
The integrated circuit has a conductive-bridge-resistive memory element (300) with an upper solid electrolyte layer (304) that contains a metal-doped glass material, where the glass material is partially amorphous. A lower solid electrolyte layer (308) contains the metal-doped glass material. A middle layer (306) is arranged between the upper and lower layers, where the middle layer contains a carbide compound. The carbide compound contains germanium carbide and silicon carbide. A glass material in the middle layer contains impurities such as carbon impurities and nitrogen impurities. The metal-doped glass material contains a germanium-selenide compound, germanium-sulfide compound, silicon-selenide compound, or silicon-sulfide compound. Independent claims are also included for the following: (1) a method for producing an integrated circuit (2) an information storing method. |