Method and apparatus for measurement of crossfield chromatic response of projection imaging systems

摘要

A method and apparatus for measuring the chromatic response of lithographic projection imaging systems is described. An apparatus for determining the lens aberrations for a lithographic projection lens is provided. A substrate coated with a suitable recording media is provided. A series of lithographic exposures are performed using an exposure source with variable spectral settings. The exposures are measured, and the measurements are used to determine a chromatic response of the projection imaging system.