发明名称 OPTICAL ELEMENT AND METHOD
摘要 <p>The invention relates to an optical element (1) for at least partial, localised correction of a wavefront error of an optical system irradiated by an optical beam, comprising a region optically active with regard to the optical beam and electrical conductor tracks (3) in said optically active region, said electrical conductor tracks having, at least partly, a diameter of at most 50 micrometres lateral to the direction of incidence of the optical beam.</p>
申请公布号 KR20090058575(A) 申请公布日期 2009.06.09
申请号 KR20097008082 申请日期 2007.09.21
申请人 CARL ZEISS SMT AG 发明人 EVA ERIC;TAYEBATI PAYAM;THIER MICHAEL;HAUF MARKUS;SCHOENHOFF ULRICH;FLUEGGE OLE;KAZI ARIF;SAUERHOEFER ALEXANDER;FOCHT GERHARD;WEBER JOCHEN;GRUNER TORALF
分类号 G02B7/02;G03F7/20 主分类号 G02B7/02
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