| 摘要 |
A wafer cleaning device having a roll brush is provided to smoothly flow the cleaning chemical for according to the surface of the roll brush by having plural protrusions. A wafer cleaning equipment(100) comprises a lower part roll brush(120) positioned in the lower part of the wafer(101), and a top roll brush(130) positioned on the top of wafer. The lower part roll brush washes the lower-part of wafer while rotating at the prescribed direction. The top roll brush washes the upper side of wafer while rotating at the lower part roll brush and opposite direction. A plurality of rotation support members supports wafer and it rotates at the specified direction at the same time. The lower part roll brush comprises the body(121), and a plurality of protrusions(122) formed in the body. It is protruded from the surface of the body with a certain height and a plurality of protrusions is arranged to the matrix type.
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