| 摘要 |
<p>A lithography apparatus and a manufacturing method of a device are provided to reduce a contact angle of an immersion liquid in a convex surface of a projection system by using an electric wetting effect. A surface(20) is periodically contacted with an immersion liquid. A first electrode(21) is electrically connected to the immersion liquid to be controlled on the surface. A second electrode(22) is electrically isolated from the immersion liquid on the surface, and is connected to the surface. The second electrode is formed inside an electric insulation layer(24) on the surface. A voltage controller(25) provides a voltage difference controlled between the first electrode and the second electrode. A whole or one part of a porous member is used as one among the first electrode and the second electrode. The porous member includes a core formed by conductive material and a coating of electric insulation material.</p> |
