发明名称 THIN FILM TRANSISTOR AND SEMICONDUCTOR DEVICE
摘要 A thin film transistor and a semiconductor device are provided to enhance current and mobility by using a layer having a high crystal property as a channel forming region. A conductive film(101) is formed on a substrate. A gate insulation film(102) covers the conductive film. A semiconductor film(103) is formed on the gate insulation film. A part of the semiconductor film is overlapped with the conductive film. A pair of semiconductor films(104) is formed on the semiconductor film. A pair of semiconductor films includes impurity element, and functions as a source region or a drain region. The first semiconductor film includes a layer which is separated from a pair of second semiconductor films and the gate insulation film.
申请公布号 KR20090057892(A) 申请公布日期 2009.06.08
申请号 KR20080112804 申请日期 2008.11.13
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 GODO HIROMICHI;MIYAIRI HIDEKAZU
分类号 H01L29/786;G02F1/136 主分类号 H01L29/786
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