发明名称 |
THIN FILM TRANSISTOR AND SEMICONDUCTOR DEVICE |
摘要 |
A thin film transistor and a semiconductor device are provided to enhance current and mobility by using a layer having a high crystal property as a channel forming region. A conductive film(101) is formed on a substrate. A gate insulation film(102) covers the conductive film. A semiconductor film(103) is formed on the gate insulation film. A part of the semiconductor film is overlapped with the conductive film. A pair of semiconductor films(104) is formed on the semiconductor film. A pair of semiconductor films includes impurity element, and functions as a source region or a drain region. The first semiconductor film includes a layer which is separated from a pair of second semiconductor films and the gate insulation film.
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申请公布号 |
KR20090057892(A) |
申请公布日期 |
2009.06.08 |
申请号 |
KR20080112804 |
申请日期 |
2008.11.13 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
GODO HIROMICHI;MIYAIRI HIDEKAZU |
分类号 |
H01L29/786;G02F1/136 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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