| 摘要 |
A semiconductor exposing device is provided to improve uniformity of CD(Critical Dimension) inside a shot by forming a concave plane of incidence of a mask oppositely to the best focus. A semiconductor exposing device includes a lighting unit(31), a mask(32) and a projection lens(33). The mask selectively projects the light of the lighting unit. The projection lens projects the light on the wafer. The plane of incidence of the mask is concavely formed. A step from the center to the edge in the plane of incidence of the mask is concave. The step is 0.1 to 03 um.
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