SUBSTRATE SUPPORTING APPARATUS FOR USE IN RTP APPARATUS

摘要

A substrate supporting apparatus for a rapid thermal process is provided to prevent the damage in a substrate rotating unit by transmitting the rotation force of the substrate rotating unit to the substrate directly. A support housing includes a flange insertion groove(113a) and a spring groove. A ring spring(114) is inserted into the spring groove. A support flange(112) is inserted into the flange insertion groove. The support flange is pushed to the outside by an elastic force of the ring spring and is closed adhered to the outer surface of an inner sidewall of the flange insertion groove. A support cylinder(111) is fitted to the upper part of the support flange and supports an edge ring(20).