发明名称 TRANSPARENT SUBSTRATE POSITION MEASURING APPARATUS, EXPOSURE APPARATUS PROVIDED WITH THE POSITION MEASURING APPARATUS, SUBSTRATE MEASURING METHOD, AND PREALIGNMENT APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a transparent substrate position measuring apparatus which can measure the edge position of a glass substrate having high light transmittance by a simple, inexpensive configuration with high precision and in a noncontact manner, an exposure apparatus provided with the position measuring apparatus capable of positioning a substrate with high precision, a substrate manufacturing method, and a prealignment apparatus. <P>SOLUTION: The transparent substrate position measuring apparatus comprises a light emitting section 31 for emitting measuring light from a direction inclined with respect to the normal line N of a substrate W, or an object under measurement, and a light receiving section 32 which is arranged opposite to the light emitting section 31 across the substrate W. Positions of edges 20, 21 of the substrate W are measured from a difference in the amount of light received between the measuring light passed through the substrate W and measuring light passed through the outside of the edge of the substrate W, which are received by the light receiving section 32. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009121920(A) 申请公布日期 2009.06.04
申请号 JP20070295648 申请日期 2007.11.14
申请人 NSK LTD 发明人 BESSHO MASAHARU
分类号 G01B11/00;G03F7/20;G03F9/00;H01L21/68 主分类号 G01B11/00
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