发明名称 GATE STRUCTURE AND METHOD OF FORMING THE SAME
摘要 A semiconductor device includes a semiconductor substrate, a dielectric layer on the substrate, and a gate on the dielectric layer. The gate has first and second ends containing a first material, a middle region between the first and second ends containing a second material. The first material has a different work function than the second material.
申请公布号 US2009142915(A1) 申请公布日期 2009.06.04
申请号 US20070950076 申请日期 2007.12.04
申请人 XIONG WEIZE 发明人 XIONG WEIZE
分类号 H01L21/441 主分类号 H01L21/441
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