BLOCKED ISOCYANATO BEARING SILICON CONTAINING COMPOSITION FOR THE FORMATION OF RESIST UNDERCOAT

摘要

[PROBLEMS] To provide a resist undercoat forming composition for use in lithography which can form a resist undercoat usable as hard mask or antireflection film. [MEANS FOR SOLVING PROBLEMS] A resist undercoat forming composition for use in lithography which comprises a hydrolyzable organosilane containing an isocyanato group or a blocked isocyanato group, a hydrolyzate of the same, or a hydrolytic condensate thereof, wherein the hydrolyzable organosilane is one represented by the general formula (1): [Chemical formula 1] (1) wherein R1 is isocyanato, blocked isocyanato, or an organic group containing either, where the end N or C atom is bonded to the Si atom to form an Si-N linkage or an Si-C linkage; R2 is alkyl, aryl, halogenated alkyl, halogenated aryl, alkenyl, or an organic group bearing epoxy, acryloyl, methacryloyl, mercapto, amino or cyano, where the end C atom is bonded to the Si atom to form an Si-C linkage; R3 is alkoxy, acyloxy or halogeno; a is an integer of 1 or 2; and b is an integer of 0 or 1 with the proviso that the sum of a and b is an integer of 1 or 2.