| 摘要 |
<p>In plasma treatment for plasma-treating an object to be treated while accommodating the object to be treated in a treatment chamber, retry treatment, cumulative plasma treatment, and maintenance judging treatment for properly performing a plasma treatment operation are performed by receiving a potential change signal induced in response to a change in plasma discharge by a discharge detecting sensor, temporarily recording the received potential change signal as signal data indicating a potential change in a signal recording unit, with reference to the recorded signal data, extracting index data indicating the state of plasma discharge such as the count value of a discharge start wave, the count value of abnormal discharge, or the count value of micro-arc discharge by a signal analyzing section, and judging the state of plasma discharge by monitoring the index data by an apparatus controlling section.</p> |
