| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing method for suppressing the occurrence of a precipitation-induced defect in a developing process, changes in a CD or dissolution of a resist pattern caused by a rinsing liquid. SOLUTION: The developing method includes: applying a developer solution onto a resist film on a substrate after exposure to progress development; shaking the developer solution off from the substrate after the development; supplying a rinsing liquid containing a polyethylene glycol-based surfactant having a hydrophobic group with a carbon number of at least 11 and having neither double bond nor triple bond, in a critical micelle concentration or lower, onto the substrate; supplying pure water to the substrate to replace the rinsing liquid on the substrate with the pure water; rotating the substrate to spread and shake off the pure water on the substrate; and drying the substrate. COPYRIGHT: (C)2009,JPO&INPIT |
