ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE

摘要

An illumination optical apparatus which illuminates an illumination objective surface with an exposure light EL includes: an illumination optical system ILS having a curved mirror 24 and a concave mirror 25 and defining a position substantially conjugate with the illumination objective surface between the mirrors 24 and 25; and a second aperture plate 5 separating a space B in which the curved mirror 24 is arranged and a space C in which the concave mirror 25 is arranged into mutually different vacuum environments or pressure-reduced environments, and having an aperture 5a through which the exposure light EL passes, the aperture 5a being arranged at a position at which a cross-sectional area of the exposure light EL is smallest, or in the vicinity of the position. It is possible to decrease the amount of passage of minute particles such as debris in relation to any downstream-side optical system.