发明名称 |
PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION |
摘要 |
To provide a photosensitive resin which realizes formation of a pattern having a good shape, without involving a problem in terms of poor compatibility between an acid generator and a photoresist primary-component polymer having an acid dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X- represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).
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申请公布号 |
US2009142697(A1) |
申请公布日期 |
2009.06.04 |
申请号 |
US20070947850 |
申请日期 |
2007.11.30 |
申请人 |
WATANABE TAKEO;KINOSHITA HIROO;YUSA SHINICHI;YAMANAKA TOMOTAKA;HAYAKAWA MASAMICHI;OSAWA YOSUKE;OGI SATOSHI;KOMURO YOSHITAKA |
发明人 |
WATANABE TAKEO;KINOSHITA HIROO;YUSA SHINICHI;YAMANAKA TOMOTAKA;HAYAKAWA MASAMICHI;OSAWA YOSUKE;OGI SATOSHI;KOMURO YOSHITAKA |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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