Vorrichtung und Verfahren zur Reinigung der inneren Oberfläche eines Vakuumgefässes mit einer Plasmaentladung mit magnetischer Neutrallinie

摘要

A surface cleaning apparatus using magnetic neutral line discharged plasma for the purpose of inner-wall surface cleaning of a vacuum vessel assembled in a semiconductor manufacturing machine, which comprises electromagnetic coils for producing a closed magnetic neutral line that is formed by circularly connecting points of zero-intensity magnetic field, rf electric field generator for continuously generating plasma by applying a rf electric field along the magnetic neutral line and a controllor for controlling the size and position of the closed magnetic neutral line and the kind, temperature and density of the plasma being generated.