发明名称 CONTROL OF ARBITRARY SCAN PATH OF A ROTATING MAGNETRON
摘要 <p>A control system and method for controlling two motors (32, 36) determining the azimuthal and circumferential position of a magnetron (42) rotating about the central axis (14) of the sputter chamber (10) in back of its sputtering target (18) and capable of a nearly arbitrary scan path, e.g., with a planetary gear mechanism. A system controller (88) periodically sends commands to the motion controller (150) which closely controls the motors. Each command includes a command ticket, which may be one of several values. The motion controller accepts only commands having a command ticket of a different value from the immediately preceding command. One command selects a scan profile stored in the motion controller, which calculates motor signals from the selected profile. Another command instructs a dynamic homing command which interrogates sensors (166, 174) to determine if the arms (190, 192) are in the expected positions or need to be rehomed.</p>
申请公布号 WO2009070265(A1) 申请公布日期 2009.06.04
申请号 WO2008US13072 申请日期 2008.11.24
申请人 APPLIED MATERIALS, INC.;CHANG, YU;KUANG, WILLIAM;DEDORE, RONALD, D.;BHIMJIYANI, JITENDRA, R.;ZHANG, WESLEY, W. 发明人 CHANG, YU;KUANG, WILLIAM;DEDORE, RONALD, D.;BHIMJIYANI, JITENDRA, R.;ZHANG, WESLEY, W.
分类号 C23C14/34;H01J37/32 主分类号 C23C14/34
代理机构 代理人
主权项
地址