| 摘要 |
<p>A photo-curable composition which attains suppression of scum generation and high close adhesion to a substrate in the step of forming a three-dimensional pattern by photo-imprinting, more particularly, a photo-curable composition for forming a three-dimensional pattern by photo-imprinting, characterized by comprising a photopolymerizable monomer, inorganic nanoparticles provided with a dispersant, and a photo- polymerization initiator. The inorganic nanoparticles have a mean particle diameter of 1 to 1000nm and are made of silica. The dispersant is a silane coupling agent, preferably, a silane coupling agent which contains either an organic group bearing a carbon-carbon unsaturated linkage or an epoxy-containing organic group.</p> |
