METAL-ORGANIC COMPOUNDS CONTAINING AN AMIDINATE LIGAND AND THEIR USE OF VAPOUR PHASE DEPOSITION OF METAL CONTAINING THIN FILMS

摘要

Compound of the Formula (I): (R1NC(R2)NR3)M(=NR4)y[(NR5 R6Jz1(NR7 R8) Z2] wherein, y is an integer, y > 1, Z1 and z2are integers, Z1 > 0 and Z2 = 0, and, 2y + z1 + z2 = 4; M is a group V metal selected from Tantalum (Ta), Niobium (Nb) and Vanadium (V), R1, R2, R3, R4, R5, R6, R7, and R8 which may be identical or different, are independently chosen from Hydrogen atom, linear or branched alkyl groups having from one to six carbon atoms, linear or branched alkoxy groups having from one to six carbon atoms, linear or branched alkylamide groups having from one to six carbon atoms, linear or branched alkylsilylamide groups having from one to six carbon atoms, linear or branched alkylsilyl groups having from one to six carbon atoms.