发明名称 |
INSULATING GATE BIPOLAR TRANSISTOR |
摘要 |
<p>Fluctuation of switching characteristics of an insulating gate bipolar transistor (IGBT) having an NPT (Non Punch Through) structure is suppressed. In the IGBT, in a region (A) not covered with an interlayer insulating film (9) in a region between trenches (2, 2) adjacent to each other, a P type base region (4) and an N+ type emitter region (7) are formed, and a PN junction composed of an N- type drift layer (3) and a base layer (4) is formed. In a region (B) covered with the interlayer insulating film (9), since the base region (4) is not formed, an PN junction is not formed. Thus, in the region (B), floating state of the base region (4) is not generated.</p> |
申请公布号 |
WO2009069834(A1) |
申请公布日期 |
2009.06.04 |
申请号 |
WO2008JP72114 |
申请日期 |
2008.11.28 |
申请人 |
SANYO ELECTRIC CO., LTD.;SANYO SEMICONDUCTOR CO., LTD.;OKADA, KIKUO;HOSOYA, TAKUMI |
发明人 |
OKADA, KIKUO;HOSOYA, TAKUMI |
分类号 |
H01L29/78;H01L29/739 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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