DETACHABLE EDGE RING FOR THERMAL PROCESSING SUPPORT TOWERS

摘要

An edge ring (152) for use in batch thermal processing of wafers (30) supported on a vertical tower (140) within a furnace (160). The edge rings are have a width approximately overlapping the periphery of the wafers and are detachably supported on the towers equally spaced between the wafer to reduce thermal edge effects. The edge rings have may have internal or external recesses to interlock with structures on or adjacent the fingers of the tower legs (142, 144, 146) supporting the wafers or one or more steps formed on the lateral sides of the edge ring may slide over and then fall below a locking ledge associated with the support fingers. Preferably, the tower and edge ring and other parts (168, 180) of the furnace adjacent the hot zone are composed of silicon.