| 摘要 |
<P>PROBLEM TO BE SOLVED: To establish a method for easily making a photosensitive resin transfer layer which enables to form a fine structure having high accuracy and a high aspect ratio, and a shaped body with a structure having a high aspect ratio, through simple processes with high yields. <P>SOLUTION: In the method for forming the photosensitive resin transfer layer, a substrate provided with irregularity on a surface thereof and a base material with a photosensitive resin layer formed on a surface thereof are placed opposite to each other in such a way that the irregularity and the photosensitive resin layer are located inward, the substrate and the photosensitive resin layer are pressure-bonded, and the base material is peeled from the photosensitive resin layer to form a photosensitive resin transfer layer on the substrate provided with irregularity, wherein the photosensitive resin layer contains a polyfunctional epoxy resin and a photo-cationic polymerization initiator. A transfer layer thus formed is patterned by photolithography to obtain a shaped body with a structure having a high aspect ratio. <P>COPYRIGHT: (C)2009,JPO&INPIT |
