| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating method and a coating device for a colored photoresist such that even when a glass substrate vacuum-sucked using a slit nozzle is coated with the colored photoresist, a film thickness difference of a coating film due to suction by an opening portion is not generated and outward shape (density) unevenness is not observed. SOLUTION: The suction from the opening portion 34 of a vacuum table 31 is interrupted right before the slit nozzle 23 moves onto the opening portion to cancel the vacuum suction by the opening portion, and after the suction from the opening portion is restarted after the slit nozzle passes over the opening portion to continue the vacuum suction by the opening portion. The coating device has a function of interrupting the suction from the opening portion right before the slit nozzle moves onto the opening portion of the vacuum table and restarting the suction from the opening portion after the slit nozzle passes over the opening portion. COPYRIGHT: (C)2009,JPO&INPIT |
