| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical element for attenuating light in a photolithographic system and other optical system, without impairing the quality of light. <P>SOLUTION: The optical element 200 includes a glass optical system 202 having 1,000 μm or less of thickness between the first surface and the second surface, and a pattern 203 arranged on the first surface of attenuating the light incident into the first surface of the glass optical system 202. <P>COPYRIGHT: (C)2009,JPO&INPIT |
