| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a fused quartz glass having a low dusting property which is suitable for use in a member for manufacturing a semiconductor, a member for manufacturing a liquid crystal and a member for manufacturing a MEMS (micro-electro-mechanical system) by using plasma etching at a low cost. <P>SOLUTION: The fused quartz glass excellent in a low dusting property is made by using a natural silica in which the ratio of elements having corrosion resistance to a gaseous halide as the local concentration of a defective part due to foreign substances is less than 0.4 wt.% and preferably the concentration of both Zr and Al at a defective part due to foreign substances is less than 0.1 wt.%. The fused quartz glass of this kind is manufactured by flowing the melt to generate a shearing stress inside the melt in manufacturing the fused quartz glass and a minute defective part due to foreign substances observed by a schlieren method in the fused quartz glass of this kind has a length of 1.3 mm or more. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
