发明名称 PLASMA TREATMENT BETWEEN DEPOSITION PROCESSES
摘要 Embodiments of the present invention include an improved method of forming a thin film solar cell device using a plasma processing treatment between two or more deposition steps. Embodiments of the invention also generally provide a method and apparatus for forming the same. The present invention may be used to advantage to form other single junction, tandem junction, or multi-junction solar cell devices.
申请公布号 US2009142878(A1) 申请公布日期 2009.06.04
申请号 US20080263253 申请日期 2008.10.31
申请人 APPLIED MATERIALS, INC. 发明人 CHOI SOO YOUNG;CHAE YONG-KEE;SHENG SHURAN;LI LIWEI
分类号 H01L21/02;H01L31/18 主分类号 H01L21/02
代理机构 代理人
主权项
地址