PLASMA PROCESS ELECTRODE AND PLASMA PROCESS DEVICE

摘要

An anode on which a substrate processed by plasma is placed, and a cathode (10) which is confronted with the substrate across a space where plasma is generated and which has a first main face (14) where a plurality of first grooves (4) are arranged and a second main face (16) which is confronted with the first main face (14) and which has a plurality of second grooves (6) that cross a plurality of the first grooves (4) and are narrower than a plurality of the first grooves (4) are disposed. Through holes (8) passing through the second main face (16) from the first main face (14) are arranged in intersections of the first grooves (4) and the second grooves (6).