| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation source device in which individual provision of gas in an area where radiation travels from a radiation source to an illuminator is extremely small with regard to the suppression of debris particles in the area. <P>SOLUTION: The lithographic apparatus includes the radiation source for generating the radiation, an illuminating system for adjusting the radiation, a patterning device for patterning the adjusted radiation, and a projection system for projecting the patterned radiation onto a target section of a substrate. The illuminating system includes a debris suppressing system for suppressing the debris particles produced by the generation of the radiation and an optical system for collecting the radiation. The debris suppressing systems are disposed so as to directly evaporate the debris particles, to directly charge the debris particles, to directly generate plasma from the debris particles, or to perform those arbitrary combinations, in a path where the radiation travels from radiation source to the optical system. <P>COPYRIGHT: (C)2009,JPO&INPIT |
