发明名称 BEVEL/BACKSIDE POLYMER REMOVING METHOD AND DEVICE, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM
摘要 A bevel/backside polymer removing method removes multi-layered bevel/backside polymers adhering to a bevel surface and a backside of a target substrate. The multi-layered bevel/backside polymers include an inorganic layer and an organic layer. The bevel/backside polymer removing method includes mechanically destroying the multi-layered bevel/backside polymers and heating residues of the multi-layered bevel/backside polymers mechanically destroyed.
申请公布号 US2009143894(A1) 申请公布日期 2009.06.04
申请号 US20080268649 申请日期 2008.11.11
申请人 TOKYO ELECTRON LIMITED 发明人 SAKURAGI ISAMU;KITAMURA AKINORI;HIROKI TSUTOMU;SHINDO TAKEHIRO
分类号 G06F17/00;B23K26/16;B24B1/00;B24B7/04 主分类号 G06F17/00
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