METHOD FOR CLEANING MASK SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for cleaning a mask substrate, which minimizes adhesion of residual sulfuric acid ions on the mask substrate with a high removing rate of foreign matter, and never damages a light-shielding film or phase shift film of the mask substrate.

SOLUTION: The method for cleaning a mask substrate having a light shielding film or phase shift film on a transparent substrate comprises a first process of irradiating the mask substrate with ultraviolet ray; a second process of cleaning the mask substrate by dipping it in ozone water; a third process of cleaning the mask substrate by dipping it in hydrogen water, ammonia water or ammonia hyperhydration; and a fourth process of drying the mask substrate.

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