| 发明名称 |
ETCHANT FOR FORMATION OF TEXTURE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an etchant to easily and stably reproduce fine pyramidal recess-projection portions having excellent uniformity. <P>SOLUTION: The uniform and fine pyramidal recess-projection portions can be obtained stably on the silicon surface by adding aliphatic polyalcohol on the basis of alkali metal hydroxide solution. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
| 申请公布号 |
JP2009123811(A) |
申请公布日期 |
2009.06.04 |
| 申请号 |
JP20070294253 |
申请日期 |
2007.11.13 |
| 申请人 |
NIIGATA UNIV;NIIGATA TLO:KK;NAOETSU ELECTRONICS CO LTD;SHIN ETSU CHEM CO LTD |
发明人 |
USUI SATOSHI;TSUTSUI TSUYOSHI;AKATSUKA TAKESHI;ONISHI TSUTOMU |
| 分类号 |
H01L21/308;H01L21/306;H01L31/04 |
主分类号 |
H01L21/308 |
| 代理机构 |
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代理人 |
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| 地址 |
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