发明名称 MANUFACTURING METHOD OF THICK FILM PRINTED MATTER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide the manufacturing method of thick film printed matter by which paper degradation can be suppressed to the minimum and ink which contains neither a solvent nor a photopolymerization initiator and which is soft to environment and is safe, is used in a field where low energy electron beams of 300 kV or less is utilized as a drying system of the printed matter. <P>SOLUTION: The manufacturing method of the thick film printed matter using oxidative polymerization combining super low energy electron beam curing type ink, is provided. The oxidative polymerization combining super low energy electron beam curing type ink comprises "a super low energy electron beam curing composition" which is cured by using super low energy level electron beams of 30 to 80 kV acceleration voltage and "an oxidative polymerization composition" which is dried by oxygen. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009119678(A) 申请公布日期 2009.06.04
申请号 JP20070295147 申请日期 2007.11.14
申请人 NATIONAL PRINTING BUREAU 发明人 FUJISAWA NAOKO;KAWAMURA EIJI
分类号 B41M1/10;B41F23/04;B41M1/12;C09D11/02;C09D11/037 主分类号 B41M1/10
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