| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for conducting a pattern test capable of reducing false defects. SOLUTION: The pattern test apparatus 100 is equipped with: an optical image acquiring section 150 for acquiring optical image data of a test sample formed in a pattern; a level adjusting circuit 140 which inputs the optical image data and reference image data corresponding to the optical image data, and adjusts at least one of a pixel value level of the optical image data and a pixel value level of the reference image data from a relation between a plurality of pixel values of the optical image data and a plurality of pixel of values of the reference image data; and a comparing circuit 108 for comparing the optical image data with the reference image data being respectively adjusted in the pixel value level. COPYRIGHT: (C)2009,JPO&INPIT
|
