发明名称 MANUFACTURING METHOD OF Cu-In-Ga TERNARY SINTERED ALLOY SPUTTERING TARGET
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a Cu-In-Ga ternary sintered alloy sputtering target, which is used for forming a Cu-In-Ga-Se quaternary alloy film for forming a light absorbing layer of a solar cell. SOLUTION: A Cu-Ga binary mother alloy powder having a component composition containing, by mass, 20-50% Ga, and the balance Cu with inevitable impurities as raw material powder, Cu-In binary mother alloy powder having a component composition containing 20-70% In, and the balance Cu with inevitable impurities as raw material powder, and pure Cu powder are prepared. These raw material powders are blended and mixed so as to have a component composition containing, 40-60% In, 1-45% Ga, and the balance Cu to produce the mixed powder. The obtained mixed powder is press-formed to manufacture a formed body, and the obtained formed body is sintered. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009120863(A) 申请公布日期 2009.06.04
申请号 JP20070292738 申请日期 2007.11.12
申请人 MITSUBISHI MATERIALS CORP 发明人 OTOMO KENJI;ODA JUNICHI
分类号 C23C14/34;C22C1/04;C22C9/00;C22C28/00 主分类号 C23C14/34
代理机构 代理人
主权项
地址