发明名称 FILM FOR SEMICONDUCTOR, METHOD FOR PRODUCING FILM FOR SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE
摘要 <p>Disclosed is a film for semiconductor wherein an adhesive layer, a first cohesive layer and a second cohesive layer are bonded together in this order and the peripheral portion of the second cohesive layer extends beyond the peripheral portion of the first cohesive layer. This film for semiconductor is used for cutting a semiconductor wafer by arranging the semiconductor wafer on a side of the adhesive layer which is opposite to the side on which the first cohesive layer is arranged, while bonding a wafer ring onto the peripheral portion of the second cohesive layer. This film for semiconductor is characterized in that the adhesive force A1 (cN/25 mm) of the first cohesive layer to the adhesive layer is lower than the adhesive force A2 (cN/25 mm) of the second cohesive layer to the wafer ring. Also disclosed is a semiconductor device characterized by being manufactured using such a film for semiconductor.</p>
申请公布号 KR20090057134(A) 申请公布日期 2009.06.03
申请号 KR20097008051 申请日期 2007.10.04
申请人 SUMITOMO BAKELITE COMPANY LIMITED 发明人 HIRANO TAKASHI;SASAKI AKITSUGU;ODA NAOYA
分类号 H01L21/301;B32B27/00;C09J7/02;C09J201/00 主分类号 H01L21/301
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