SUBSTRATE PROCESSING APPARATUS USING NEUTRALIZED BEAM AND METHOD THEREOF

摘要

A substrate processing apparatus using neutralized beam and method thereof are provided to apply the predetermined voltage in the substrate support and to prevent the damage of the substrate to be treated due to the remaining non-neutralized ion. The ion source generator(110) forms ion source. The ion extracting apparatus(120) extracts ions from the ion source and accelerates them. The ion neutralizer(140) neutralizes the extracted and accelerated ions by the neutral beam. The substrate power supply device(160) supplies the power to the substrate support and blocks that the remaining neutralized ions reaches the processed substrate. The ion source generator forms the plasma as the ion source.