| 摘要 |
A nitrogen gas supply apparatus and a method for fabricating a semiconductor device are provided to reduce a time for removing moisture after cleaning a semiconductor by supplying a high temperature nitrogen gas to a semiconductor process line. A nitrogen gas supply line(110) supplies a nitrogen gas from a nitrogen gas supply source, and a gas separation unit(120) connected with a supplying line separates a nitrogen gas according to the heating nitrogen and cooling nitrogen. A gas separation unit comprises a pressure adjustment valve(121) controlling the pressure of the supplied nitrogen gas, and a heating nitrogen supply line(130) is connected with the gas separation unit and supplies the heating nitrogen. The cooling nitrogen supply line(140) is connected with the other terminal of the gas separation unit. A temperature sensor is connected to the end of the cooling nitrogen supply line and the heating nitrogen supply line.
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