| 摘要 |
An Ag-based sputtering target is provided to form an Ag-based thin film with uniform thickness and small deviation of grain size. An Ag-based sputtering target is made of pure Ag or Ag alloy, having a sputtering surface whose average grain diameter is 10mum or less. The average grain diameter is measured by selecting several points in the sputtering surface and taking the microphotographs of the selected points. The grain diameters observed in all the microphotographs are calculated after photographing. Four or more straight lines are drawn in the shape of # or in a radial form on each microphotograph and the number of grain systems on the straight lines is observed, and then the grain diameter of each straight line is calculated. The Ag alloy contains at least one selected from a group consisting of Nd, Bi, Au and Cu.
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