发明名称 |
Process for producing an image using a first minimum bottom antireflective coating composition |
摘要 |
<p>Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate » 2 �¢ n wherein » is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.</p> |
申请公布号 |
EP1720066(A3) |
申请公布日期 |
2009.06.03 |
申请号 |
EP20060015443 |
申请日期 |
2003.01.03 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
NEISSER, MARK O.;OBERLANDER, JOSEPH E.;TOUKHY, MEDHAT A.;SAKAMURI, RAJ;DING-LEE, SHUJI |
分类号 |
G03F7/09;G03F7/11;G03F7/004;G03F7/039;G03F7/095;G03F7/32;H01L21/027 |
主分类号 |
G03F7/09 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|