| 摘要 |
Provided is an in-line film-formation apparatus including: deposition sources (2, 3), deposition-preventing plates (5 A , 5 B ), and a screen (6). The deposition sources (2, 3) store different film-formation materials (A, B), and include openings (2a, 3a) extending in the width directions of a substrate (4), which is perpendicular to the conveying direction (T). The openings (2a, 3a), arranged in parallel with each other, are disposed respectively on the upstream and the downstream sides in the conveying direction (T). The plates (5 A , 5 B ), partitioning a co-deposition chamber (1) from adjacent deposition chambers and placed, in parallel to each other, on the upstream and the downstream sides in the conveying direction (T) , limit a deposition region of the vapor from the openings (2a, 3a). The screen (6) limits and makes the deposition regions of the substrate (4) for vapor from openings (2a, 3a) coincide with deposition regions limited by the plates (5 A , 5 B ). Thereby, the formation of a mono-content film is prevented and only the mixed film is formed on the substrate.
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