PROCESSING METHOD FOR PHOTORESIST MASTER, PRODUCTION METHOD FOR RECORDING MEDIUM-USE MATER, PRODUCTION METHOD FOR RECORDING MEDIUM, PHOTORESIST MASTER, RECORDING MEDIUM-USE MASTER AND RECORDING MEDIUM

摘要

Method of processing photoresist master, comprises irradiating photosensitive layer non-continuously using pulse like laser beam and then developing to form recess and protrusion patterns. Independent claims are also included for the following: (1) a similar method wherein the laser beam duty ratio varies according to the length of the patterns; (2) a similar preparation wherein the protrusion and recess patterns are transferred to the master plate from the photosensitive layer; (3) a similar method comprising a step of forming the pattern corresponding to one pre-pit; (4) a similar method using at least 2 or more pulses of laser beam; (5) a similar method comprising a step of forming pre-pit on the substrate by transferring the patterns from the master disk; (6) the disks obtained; and (7) recording media using the master disk.