| 摘要 |
A chemical vapor deposition apparatus is provided to prevent the generation of foreign materials during process by using a wheel including a magnet wheel and a fixed plate including a magnet plate so that the wheel rotates above the fixed plate. A chemical vapor deposition apparatus(1) comprises a plurality of domes(310) in which a plurality of wafers are mounted, a jig(320) having a plurality of locking arms(321) which are located apart from each other and face downward in order to fix the domes, a wheel(330) having a bearing which connects each dome and each locking arm and a magnet wheel in which an N pole magnet and an S pole magnet are formed to cross each other along the circumference of the bearing, a fixed plate(340) which is arranged to be fixed below the wheel and has a magnet plate in which an N pole magnet and an S pole magnet are formed to cross each other, opposite to the magnet wheel, and a rotating shaft(350) which is formed in the upper center of the jig and rotates the jig. The jig includes first and second stationary shafts(323,324) which are located at an interval around the rotating shaft. The jig and the rotating shaft are fixed by a third shaft penetrating the rotating shaft and the first and second stationary shafts.
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