FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPOSURE, AND METHOD OF FORMING RESIST PATTERN

摘要

A fluorine-containing compound is provided to ensure insolubility to alkaline developing solution due to a base-dissociative group, to produce phenolic -OH as hydrophilic group, and to increase solubility to the alkaline developing solution. A fluorine-containing compound represented by a general formula of R^X-A_N-(OR^2)a, wherein, R^X represents an organic group, A_N represents a naphthalene ring that may have a substituent, R^2 represents a base dissociable group, and a represents 1 or 2, provided that at least one among A_N and said a R^2 groups contains a fluorine atom.