发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 A substrate processing apparatus is provided to secure maintenance space sufficiently while reducing manufacturing costs by driving a plurality of nozzles with one driving unit. A processing solution supply unit sprays a processing liquid, and a processing liquid supply line is a transfer line where the processing liquid is delivered from a processing liquid storage to a first nozzle(210) and a second nozzle(212). The first nozzle and the second nozzle are installed at a first arm(260) and a second arm respectively, and the first arm and the second arm are connected with a first pivot shaft and a second pivot shaft and are turned by a certain angle from the pivot shafts.
申请公布号 KR20090055995(A) 申请公布日期 2009.06.03
申请号 KR20070122916 申请日期 2007.11.29
申请人 SEMES CO., LTD. 发明人 HA, CHONG EUI
分类号 H01L21/304 主分类号 H01L21/304
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